Abstract
Contact or proximity aligners or 1:1 projection aligners are conventionally used for patterning large-area devices like silicon strip detectors for high-energy particle detection. Reduction steppers offer a far better pattern fidelity and an increased productivity but a very limited field size. This paper describes methods to overcome the field size limitations to pattern large-area position-sensitive particle detectors automatically and accurately with a 5:1 reduction stepper.
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