Patterned microsphere-lens projection lithography using an electrohydrodynamic-jet-printing-assisted assembly

Abstract

Microlens arrays have been widely used in the fields of micro-optics and micro- and nanofabrication. Traditional preparation methods utilize commercial photoresists and thermosetting materials, thereby restricting the optical properties of microlenses. In recent years, significant advancements have been achieved in near-field super-resolution imaging by utilizing microspheres and forming arrays of microsphere lenses via self-assembly. However, self-assembly approaches lack flexibility in terms of pattern selection. This study proposes a method that utilizes electrohydrodynamic jet (E-jet) printing to code ultraviolet (UV)-curable adhesives and assist in the assembly of patterned microsphere-lens arrays. Simulation results demonstrate that the UV-curable adhesive has little impact on the optical properties of the microsphere lens. Moreover, the microsphere lens exhibits a superior imaging resolution compared with traditional microlenses. A projection-lithography system is developed to achieve an accurate alignment between the focal plane of the microsphere lenses and the plane of the photoresist, facilitating the fabrication of patterned nanostructures. The lithographic nanostructures have a minimum feature size of 850 nm. This method enables the fabrication of arrays of microsphere lenses with arbitrary patterns and presents an inexpensive and simple strategy for fabricating micro- and nanostructure arrays with submicrometer features.