Patterned assembly of silicon nanoparticles via femtosecond laser bubble printing for high-performance photodetector applications

Abstract

With the ever-growing development for nanomaterials, the integration of nanomaterials into electronic devices and sensors requires flexible and efficient selective patterning deposition of the nanomaterials. However, existing patterning techniques of these nanomaterials is limited in practical applications due to the use of templates and tedious preparation process. Here, a facile femtosecond laser bubble printing (FsLBP) technique without mask and tedious preparation process that integrates patterning, assembly, and deposition of nanomaterials is presented. Benefiting from the advantages of this processing technology, arbitrarily patterned assembled silicon (Si) nanoparticles were successfully prepared. In addition, the effect of viscosity and surface tension of the solution in the process of FsLDW on the deposited Si nanoparticles is explored. Owing to the rough and porous structure of the assembled microwires, the microwires have a high-efficiency light trapping ability with an average reflectivity of 2% for visible light and the photodetector based on porous Si microwires exhibits a responsivity of 231 A/W under the irradiation of 365 nm ultraviolet (UV) light. Finally, a device for real-time monitoring of ultraviolet light intensity was obtained, which demonstrate the potential application of the ultrafast laser fabrication method in patterned assembly of nanomaterials.