Abstract
GaAs nanostructures were grown on patterned GaAs (111) B substrates with molecular beam epitaxy. Nanopatterns were achieved by patterning a thin film of silicon dioxide (SiO2) grown on the substrate surface with a self-organized porous alumina template. Growth of patterned nanostructures took place through the holes in the SiO2 film. The authors obtained two kinds of nanostructures: nanopillars and nanodots. The majority of nanopillars had two kinds of tops, i.e., hexagonal flat top and pyramidal top, as observed with a scanning electron microscope. High resolution transmission electron microscopy studies showed epitaxial relationships between the nanostructures and the substrates. Photoluminescence measurements of nanopillars showed the photoluminescence peak shifted to a higher energy compared to films grown under the same condition.
Published Version
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More From: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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