Abstract
The aim of the present study was to form a nitride layer on a titanium (Ti) substrate through a compact laser‐nitriding system comprising a focused pulsed Nd:YAG laser and nitrogen gas blow. To obtain a high‐quality layer, the effects of pulse frequency and gas flow rate on the surface characteristics were investigated by using plasma emission analysis as well as X‐ray analyses. Optical emission spectra from the laser‐induced plasma mainly consisted of ionic Ti lines, and their intensities when the pulse frequency was 15 Hz were much higher than those for 8 Hz. Similarly, the reflections from the δ‐TiN phase in the X‐ray diffraction (XRD) pattern were enhanced when using 15 Hz. On the other hand, the flow rate of nitrogen gas blow had a significant effect on the thickness of the thin oxide layer that formed above the nitride layer. Using a lower flow rate resulted in the formation of a thicker oxide layer. The higher pulse frequency and the faster flow rate were beneficial for obtaining a higher‐quality layer because of the enhancement of nitridation and the suppression of oxidation, respectively.
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