Abstract
Results are presented from parallel computations of one-dimensional (1-D) and twodimensional (2-D) microscale heat conduction in multilayered films involving the materials silicon (Si) and silicon dioxide (SiO2). The equation of phonon radiative transport (ERPT), in its spectral as well as frequency-independent form, is considered for numerical modeling using finite-difference methods. Parallelization strategies based on Message Passing Interface (MPI) routines are explored in an effort to achieve computational efficiency. The numerical solution results address the effects of film thickness, grain boundary scattering, and interfacial boundary conditions on the time-dependent temperature distribution within the microscale films.
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