Abstract
Nanometric profiles of sputtered ultra-thin Pd layers with thicknesses in the range 1 - 10 nm were investigated by capturing the leaking evanescent light from optical waveguides. The Pd films were deposited by sputtering on glass substratesalso servingas light waveguides. Calibrating the thickness values for the ultra-thin Pd films obtained from the sputtering rate combined with the DELI estimation technique, gave detailed 1Dand 3D morphological nanometric profiles of the deposited layers.
Highlights
In this work we used the optical microscopy technique named Differential Evanescent Light Intensity (DELI) to investigate nanostructures profiles of Pd sputtered thin films in the ultra-thin thickness range of 1 - 10 nm [1]
DELI is an optical evanescent waves microscopy technique based on capturing the light extracted by nano layers deposited on a substrate which serves as a waveguide [2,3]
We rely on the “evanescent light extraction power” of the nanoparticles and nanolayers deposited on a substrate which serves as an optical waveguide
Summary
In this work we used the optical microscopy technique named Differential Evanescent Light Intensity (DELI) to investigate nanostructures profiles of Pd sputtered thin films in the ultra-thin thickness range of 1 - 10 nm [1]. DELI is an optical evanescent waves microscopy technique based on capturing the light extracted by nano layers deposited on a substrate which serves as a waveguide [2,3]. The technique is based on the phenomenon of Total Internal Reflection (TIR) [5,6] at interfaces where evanescent waves occur. This technique has the advantage that the far field image does not include external transmitted or reflected light beams. The depth, z-axis light beam evanescent intensity variation in the vicinity of the boundary interface between the two media is given by [5,6]: Iew z
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