Abstract
A discrete model of the Differential Evanescent Light Intensity (DELI) technique was developed to calculate and map 3D nanolayers thicknesses from the evanescent light intensity captured from optical waveguides. The model was used for ultra-thin Pd nanometric layers sputtered on glass substrates. The layers thickness profiles were displayed in 3D and 1D profiles plots. The total thickness profiles of the ultra-thin Pd films obtained in the range of 1-10 nm were validated using AFM measurements. Based on the model developed the evanescent photon extraction parameter of the material was estimated.
Highlights
The investigation of optical scattering from nanostructures shows a growing interest due to current trends for novel nanometric surface analysis techniques
The Differential Evanescent Light Intensity (DELI) surface morphology observation technique is much easier to perform, faster, and non-destructive for nanometre films profiling as compared to electron beam microscopy (EBM) or even the simpler atomic force microscopy (AFM)
In this work we describe a discrete model for DELI which in addition to the evanescent phenomenon takes into account the optical absorption
Summary
The investigation of optical scattering from nanostructures shows a growing interest due to current trends for novel nanometric surface analysis techniques. The DELI surface morphology observation technique is much easier to perform, faster, and non-destructive for nanometre films profiling as compared to electron beam microscopy (EBM) or even the simpler atomic force microscopy (AFM). It is better suited for nanostructures morphology mapping of large areas as required for instance in industrial applications [10]-[16]. In this work we describe a discrete model for DELI which in addition to the evanescent phenomenon takes into account the optical absorption This discrete model is utilized to analyse and construct the thickness profiles of sputtered Pd films with ultra-thin thicknesses in the range of 1 - 10 nm and the results are compared in Section 3 with the previously used model in Ref. This discrete model is utilized to analyse and construct the thickness profiles of sputtered Pd films with ultra-thin thicknesses in the range of 1 - 10 nm and the results are compared in Section 3 with the previously used model in Ref. [15]
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