Abstract
One of the most important goals of flat panel display (FPD) manufacturing is to reduce the cost of excimer laser annealing (ELA) processes of low‐temperature poly‐Si (LTPS) technology. We developed novel XeF (351 nm) and KrF (248 nm) excimer lasers specially designed for ELA. The semiconductor‐field‐proven excimer laser technologies are applied to stabilize the operation and to reduce the cost.
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