Abstract
As the Capacitor insulation, the quality of CI film plays an important role in the drive circuit. However, the traditional plasma enhanced chemical vapor deposition method can cause broken particle and film. It may further result in the leakage of capacitor and VDD signal writing to drive TFT grid may caused the dark spot. As a result of greatly reducing the particle during CI layer thin film deposition by delaying special gas，the risk of product yield loss and reliability reduction which the residual film may cause has been decreased.
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