Abstract
AbstractRecently, sintered ceramic rotary ITO targets have received strong interest from the display industry. The considerably higher target utilization (TU, up to 90 %), i.e. more than a factor two better compared to planar counterparts, is the main point of attraction. Such higher target utilization gives indeed rise to much lower coating costs. However, the advantages go far beyond that: not only do rotary sintered ceramic ITO targets sputter quasi nodule free, which results in higher process stability and a better product yield, but such targets allow for higher power loads. It will be shown that higher power loads — compared to values closer in line with planar magnetrons ‐ don't negatively impact ITO thin film properties. The work will also point to total coating cost differences between the new technology and the state‐of‐the‐art.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
