Abstract
This paper first theoretically simulates the change trend of Metal reflectance with various thicknesses of IZO and MoNbOxNy, and then experimentally produces an ultra‐low‐reflective Metal film layer: 60nm IZO + 45nm MoNbOxNy, with a reflectance of 4.97%. Furthermore, the reflectance uniformity is very excellent, the maximum & minimum values within the range of the average value ± 0.50%. Subsequently, this paper performed performance tests on IZO/MoNbOxNy Metal samples. The results are as follows: ① The reflectance in the whole band of 380nm ~ 780nm is stable, all within the range of 5% ~ 7%; ② Each film layer is well crystallized, and there is no abnormality in the microscopic morphology; ③ The adhesion is good; ④ The invisible performance Level is improved from Level 5 to Level 3. The indicators meet the requirements of the TP industry and can be used to make ultra‐low reflection and good invisible touch panels.
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