Abstract
The surface roughness of Ag films (thickness of 50nm) is drastically reduced from 2.4to1.0nm by the presence of oxygen (pressure of 2×10−5mbar) during sputter growth, without a change (undermining) in electrical transport properties nor a formation of any Ag oxide phase. It is concluded that oxygen plays the role of a surfactant. The growth scenario (nonepitaxial sputter deposition of relatively thick films) makes this observation complementary to previous studies reporting surfactant effects in epitaxial growth of Ag. The authors consider an application of this finding in the field of multilayers involving Ag metals.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
