Abstract
Oxygen-based electron cyclotron resonance (ECR) plasma etching of boron doped homoepitaxial diamond films with no de bias has been achieved. The process was developed to the point where it can provide a uniform and reproducible etching procedure that yields smooth damage-free etched surfaces. Etch rates attained under these conditions of smooth damage-free etched surfaced were about 86 Å/min.
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