Abstract
Cr 1− X Al X N films were synthesized on mirror-polished stainless steel substrates by the arc ion plating method using Cr 1− X Al X alloy targets with diffent Al contents. Oxidation resistance of films was estimated by heating substrates in air at 800, 900 and 1000 °C and subsequent analysis by the X-ray diffraction method (XRD). The XRD peaks from Ti 0.7Al 0.3N films, annealed at 800 °C for 14 h, disappeared and the peaks from iron oxides consequently appeared. The oxidation resistance of Ti 1− X Al X N films improved with increasing Al content X. On the other hand, the peaks from Cr 1− X Al X N films which were annealed at 800 °C did not change at all, but Cr 1− X Al X N films were slightly oxidized over 900 °C. It is considered that the oxidation resistance of Cr 1− X Al X N films was superior to that of Ti 1− X Al X N films.
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