Abstract
TiN film, 3 μm in thickness, was deposited on aluminum (JIS A 1050) and aluminum alloy (JIS A 2017 and JIS A 5052) substrates by an Arc Ion Plating (AIP) method. Bias voltage and N2 gas pressure were changed to examine their role on hardness and residual stress of TiN film. Wear experiment was also conducted using a ball-on-disk type wear apparatus. Vickers hardness tests revealed high value (HV=2 100∼2 400) which depends on both bias voltage and N2 gas pressure. The TiN films exhibited very high {111} preferred orientation. Residual stresses in the TiN film were measured by the two-exposure X-ray stress measuring method as a function of N2 gas pressure. Very high compressive residual stresses, -6.3∼-4.6GPa, were observed. The depth of wear scars on the surface of the processed specimens were greatly shallow.
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