Abstract
An investigation was carried out into the oxidation resistance of alloys of the quasi-binary systems WSi2-NbSi2 and W5Si3-Nb5Si3. It was demonstrated that, at a temperature of 1000° C, neither WSi2 and W5Si3 nor NbSi2 and Nb5Si3 are oxidation resistant. All intermediate alloys in the two systems investigated have a higher oxidation resistance than the starting compounds. The highest oxidation resistance in the system WSi2-NbSi2 is shown by an alloy in the field of the solid solution (Nb, W)Si2 and in the system W5Si3-Nb5Si3 by an alloy in the field of the solid solution (W, Nb)5Si3. Under the conditions investigated, the oxidation rate of the alloys is determined by the structure of the oxide film forming on the alloy surface and by the physicomechanical properties of the film.
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