Oxidation of tunnel barrier metals in magnetic tunnel junctions

Abstract

The oxidation of an ultrathin metal layer (<1nm) to form an oxide tunnel barrier is of critical importance for the fabrication of magnetic tunnel junctions (MTJs) with low product of resistance and area (R×A). Nonuniform and excessive or insufficient oxidation will occur by using conventional plasma, air, or O2 and noble gas mixtures as oxidation methods. An oxidation method was investigated to oxidize only an ultrathin layer of metal (such as Y) without oxidizing adjacent ferromagnetic thin film layers. We have now demonstrated that a gas mixture of H2O∕H2 with a fixed chemical potential of oxygen determined by the relative amounts of the two gases can oxidize Y and Ta thin layers while simultaneously keeping a Co ferromagnetic layer completely unoxidized. This universal method can be used to preferentially oxidize a host of other metals with high tendency to form oxides, such as Zr, Hf, Nb, rare earth metals, etc. and may allow us to access the feasible lower limit of barrier thickness in MTJs.