Abstract
The oxidation behaviour of oxynitride glasses in M-Si-Al-O-N system (M = Nd, Y) has been studied in air and under various oxygen pressures. The influence of glass composition on the oxidation resistance was studied at 1075 °C by varying Y Al or Si Al ratios and also by substituting Y by Nd and by varying the nitrogen content. The reactivities in air of the YSiAlON system is studied in the temperature range of 1000–1150 °C. The oxidation resistance of YSiAlON glasses is better than for glasses containing Nd. A pressure law is determined for the YSiAlON system based upon data from oxidation at 1050 and 1075 °C at oxygen pressures in the range of 15–100 kPa. The nature and morphology of oxidised samples were characterised by optical microscopy, XRD and SEM. These investigations reveal that the oxidation of the studied oxynitride glasses is governed by a reaction process where the progress of the internal interface is the limiting step.
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