Overview of technical solutions for improving of magnetron sputtering devices

Abstract

The paper provides a brief overview of technical solutions that allow expanding the capabilities of magnetron sputtering systems using different options for organizing an external source of charges. Among them, the following are considered in detail: electron emission in the magnetron discharge track; argon ionization in the space above the target; argon ionization in the vacuum chamber volume; the use of an uncooled "hot" target; bombardment of the target surface with a beam of argon ions. Among the solutions considered, a combination of a magnetron with an ion source or an incandescent cathode is noted, which in principle can provide equal-dimensional reactive sputtering on "long" (more than 1 m) magnetrons and flexible control of the properties of coatings intended for dimensional elements of equipment of the fuel and energy and oil and gas complexes, as well as solutions based on spraying a "hot" target, which can find industrial application for the formation of thermal barrier coatings on the blades of modern power gas turbines and aviation gas turbine engines.