Abstract
Synchrotron radiation lithography is applied to the real dynamic random access memory process. Two full chip x-ray masks whose overlay accuracy is 19.2nm (x) and 26.4nm(y) are prepared. By using Canon x-ray stepper, total overlay accuracy less than 45nm is obtained.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
