Abstract
The influence of various physical and technological parameters on the oscillatory behaviour of the Fowler-Nordheim tunneling current is investigated in ultra thin gate oxides. More specifically, the amplitude and the quasi-period of the oscillations are studied for oxide thickness varying from 3.8 nm to 7 nm, measurement temperatures from 80 K to 450 K and after stress induced electrical degradation. Besides, in order to interpret the experimental results, a modeling of the quantum Fowler-Nordheim oscillations is conducted based on the analytical Airy function approximation. This model is extended to include the temperature effect of the F-N component and the scattering induced quantum interference attenuation.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
