Abstract
AbstractThe kinetics of propyltrimethoxysilane (PTMS) films exhibit oscillatory adsorption when grown upon aluminium and iron oxide surfaces. This phenomenon is identified by the presence of non‐linear oscillations in adsorbate surface coverage, measured by X‐ray photoelectron spectroscopy (XPS), as a function of exposure time and solution concentration. In this paper, a mathematical model based upon the chemistry of the adsorption system is presented to describe the time‐dependent behaviour. The oscillatory nature of organosilane adsorption can be modelled by the evolution of three unique adsorbate species whose presence at the surface is dominated by displacement processes. The model presented here quantitatively describes the rate, non‐linearity and influence of experimental deposition parameters on PTMS adsorption. From the mathematical construct, a model of the physical origins of the oscillatory adsorption phenomenon is presented. Copyright © 2001 John Wiley & Sons, Ltd.
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