Abstract
The growth kinetics of surface films of propyltrimethoxysilane (PTMS) deposited on aluminium and iron oxide surfaces exhibit oscillatory adsorption. This phenomenon involves non-linear oscillations in surface coverage of the adsorbate, as measured by x-ray photoelectron spectroscopy (XPS), as a function of exposure time and solution concentration. In this paper, a mathematical model is presented to describe the experimentally observed time-dependent behaviour. The oscillatory nature of the adsorption can be modelled by a superposition of adsorption and desorption processes. The model quantitatively describes the rate and non-linearity of these processes. Using this model, the influence of the substrate upon the various adsorption processes is described quantitatively. A model for the physical origins of the three processes is presented. Copyright © 2000 John Wiley & Sons, Ltd.
Published Version
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