Abstract
Nanoimprint lithography (NIL) is a promising technology that can fabricate structures with high resolution and high throughput. To replicate patterns through NIL, a high quality master mold is needed. A UV patternable inorganic–organic hybrid polymer, OrmoStamp with high resolution is promising for the fabrication of NIL molds. Here, OrmoStamp molds were fabricated by proton beam writing (PBW) in resist followed by OrmoStamp casting. In this paper, different resists (HSQ, PMMA, SU-8 and SML) were evaluated by PBW for OrmoStamp mold fabrication. The results show that HSQ gives the smallest line width down to 30nm. These lines have subsequently been successfully replicated in OrmoStamp. High aspect ratio structures in OrmoStamp and Ni were obtained from proton beam written resist samples, featuring an aspect ratio of ∼7 and ∼70, respectively. Finally thermal NIL has been demonstrated in PMMA using OrmoStamp molds.
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