Abstract
The possibility of obtaining thick films (3 to 7 µm) of solid solution Pd–6 wt % Ru by magnetron sputtering of a target having the corresponding composition is shown. The structure, phase composition, and surface morphology of films condensed on the surface of oxidized silicon, fluorphlogopite, and anodic aluminum oxide at 300–950 K are studied. A general trend of formation of a gradient grain structure of thick films (with a high grain dispersity level at the initial growth stage) and subsequent selective growth of grains and subgrains having an anisotropic shape and primary orientation is independent of the structure and morphology of the substrate surface.
Published Version
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