Abstract
Cu/Nb bilayers with equal layer thickness of 35 nm were grown on (001) and (111) NaCl substrates using electron beam evaporation at 350 °C. Plan-view Cu/Nb bilayer samples were prepared by dissolving NaCl substrate in water. Transmission electron microscopy (TEM) was performed to study the orientation relationships (ORs). It was found that ORs in Cu/Nb bilayers are dependent on the substrate orientation. For Cu/Nb deposited on (001) NaCl, the dominant OR is Pitsch. For Cu/Nb deposited on (111) NaCl, the dominant OR is Nishiyama-Wasserman (N-W). The preferential ORs found in the Cu/Nb bilayers can be successfully predicted by the invariant line model.
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