Abstract
Highly reflecting, amorphous, thin films of tungsten are obtained by the decomposition of bis-cyclopentadienyltungstendihydride, (η-C5H5)2WH2, in 1 atm of hydrogen at 350 °C. Auger depth profiling reveals that the carbon and oxygen content of the films are 25.1 and 3.1 at. %, respectively. Simultaneous chemical vapor deposition of tungsten with a small amount of platinum reduces the carbon and oxygen content of the film to 5.3 and 1.8 at. %. The platinum is deposited from cyclopentadienylplatinumtrimethyl, (η-C5H5)Pt(CH3)3, and its concen- tration in the film is 3.3%. Annealing at 750 °C in hydrogen converts the tungsten into a polycrystalline deposit which exhibits an x-ray diffraction pattern characteristic of the metal. The sheet resistivities of the amorphous films are 52±4 μΩ cm.
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