Abstract
In order to reduce the potentially deleterious corrosion effects associated with gases such as Cl2, I2, and XeF2, three noncorrosive organochlorides [pentachloroethane (C2HCl5), carbon tetrachloride (CCl4), and tetrachloroethene (C2Cl4)], have been investigated as more ideal chlorine sources for chemically enhanced focused ion beam micromachining (CE-FIBM) of Permalloy (Ni–Fe alloy). C2Cl4 increased the sputter yield of Permalloy by a factor of 2 while reducing micromachining generated topography from several micrometers (FIBM) to less than 100 Å (CE-FIBM). Analysis of material removal rate versus pattern refresh time indicated that material removal occurred via a chemically assisted process.
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