Abstract
Abstract In a vector scan electron beam lithography machine with a beam-size switch the small spot is used to write a feature sleeve for good edge acuity, while the large spot is used for fast feature fill-in. Features are broken down into writable ‘shapes’. Switching can be done once per shape, sub-field, main-field or plate. Which strategy is optimal depends on numerous system properties. For this project a 10 ms main-field switch resulted. Various implementations have been investigated for beam-size switches with switching times from 10 ns to 1 s.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
