Abstract

In this paper, using the transfer matrix method, we investigate dependence of high and low threshold intensity of the optical bistability (OB) on parameters of the linear middle layer placed between two nonlinear defect layers in a one-dimensional photonic crystal (1D PC), theoretically. The 1D PC is composed of alternate uniaxial anisotropic single-negative materials. It is shown that, when the middle layer is chosen isotropic right-handed the decrease of its refractive index causes the decrease of the OB threshold intensity. Also, when the middle layer is chosen uniaxial anisotropic left-handed, the optimized values of the OB threshold intensity is possible.

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