Optimized DL-TFET Design for Enhancing its Performance Parameters by Using Different Engineering Methods

Abstract

ABSTRACT Dopingless Tunnel Field Effect Transistor is a prominent device because of its low sub-threshold swing and fast switching speed. In this paper, DL-TFET is investigated for enhancing the performance parameters by applying different engineering techniques. The hetero-junction is implemented in the DL-TFET for increasing the ION current. Further, for reducing the ambipolar current and enhancing the ON-characteristics by introducing the non-uniform oxide layer, hetero-gate and then further optimization is done by varying the “x” compositions of In1-xGaxAs for source side material. The various staggered hetero-gate hetero-junction DL-TFET structures with different EBeff are comparatively investigated for analyzing their performance parameters. Among them, highly staggered Hetero-junction DL-TFET with EBeff = 0.374 eV shows better performance as lower threshold voltage, higher ION current, high transconductance and lower sub-threshold swing. So, the In0.45Ga0.55As/In0.25Ga0.75As based hetero-gate at TG = 4.2 eV and Θ = 7.59° heterojunction DL-TFET structure can be chosen for fast switching and advanced circuit application.