Optimization Study of TiO2 Film Deposited by IAD Process

Abstract

Ion assisted deposition (IAD) is a well established method to enhance the quality of optical thin film such as: higher packing density, lower spectrum shift due to moisture, higher reproducibility, more controllable film stress. TiO2 is one of the favorable thin film materials, which gains benefits from the IAD. But the searching of an optimum parameter set for the IAD process is not a simple task. Most publications only describe optical thin film properties obtained in particular parameter set of the IAD process. This study deals with the refractive index of TiO2 film as a main target for optimization. By application of Design of Experiment methodology (DOE), a relation between the TiO2 film refractive index and the parameters of IAD process was functioned. On the basis of an established function, the effect of each IAD parameter to the film'refractive index was demonstrated and an optimum parameter set was pointed out.KeywordsRefractive IndexDeposition RateAnode CurrentSoftware Design ExpertSpectrum ShiftThese keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.