Abstract
Annular subaperture stitching interferometry (ASSI) is increasingly used for precision metrology of aspheric surfaces. The stitching model is a critical factor for stitching algorithms in ASSI. An optimized stitching model is proposed, which describes the alignment errors of adjacent subapertures based on an off-axis model and wave aberration theory. To keep the stitching errors from transmitting and accumulating, a simultaneous optimization algorithm is presented. The residual difference of overlapped regions of adjacent subapertures is utilized to evaluate the stitching accuracy. Finally, the comparative numerical simulations and experiments are carried out. It shows that the optimized stitching model has a better performance and validity.
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