Abstract
The results of optimization of the design and growth conditions of an In x Al1–xAs metamorphic buffer layer with a high In content (x = 0.05–0.83) grown via MBE on GaAs(001) substrates with the purpose of optimizing its surface morphological characteristics and structural properties and lowering the surface density of threading dislocations. The lowest surface-pattern roughness RMS = 2.3 nm (on an area of 10 × 10 μm) and density of threading dislocations of 5 × 107 cm–2 are found in the samples with a convex-graded metamorphic buffer layer.
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