Optimization of the photonic crystal colloidal films deposition by means of atomic force microscopy

E V Panfilova,A B Syritskii,A R Ibragimov

doi:10.1088/1757-899x/699/1/012034

E V Panfilova, A B Syritskii + Show 1 more

Open Access

https://doi.org/10.1088/1757-899x/699/1/012034

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Abstract

This article describes the results of optimization of the colloidal photonic crystal opal films deposition by means of atomic force microscopy investigation. The main factors affecting the quality of the colloidal opal films are studied. Bragg diffraction occurs in the periodic distribution of colloidal microspherical particles, and ordered structure is critical for formation of the photonic band gap. It is found that polystyrene opal structures obtained in optimal conditions have a good periodicity, uniformity, and high packing density.

Highlights

For preparing samples authors used a colloidal solution of polystyrene monodisperse latex of particles diameters ranging from 220 nm to 330 nm and sitall substrates
The structure of the obtained films was monitored by measuring the relative area of ordered structure by means of scanning atomic force microscope Solver (NT-MDT, Russia) in semi-contact mode [2]
The photonic crystal properties were monitored by measuring the reflectance at the photonic band gap (PBG) by means of Epsilon spectrophotometer (IZOVAC, Belorussia)

Summary

Introduction

For preparing samples authors used a colloidal solution of polystyrene monodisperse latex of particles diameters ranging from 220 nm to 330 nm and sitall substrates. The original technology of opal matrices fabrication by vertical lifting from a colloidal solution [1] is described.

Results

Conclusion