Optimization of the genetic operators and algorithm parameters for the design of a multilayer anti-reflection coating using the genetic algorithm

Abstract

Abstract This paper describes a systematic investigation on the use of the genetic algorithm (GA) to accomplish ultra-low reflective multilayer coating designs for optoelectronic device applications. The algorithm is implemented using LabVIEW as a programming tool. The effects of the genetic operators, such as the type of crossover and mutation, as well as algorithm parameters, such as population size and range of search space, on the convergence of design-solution were studied. Finally, the optimal design is obtained in terms of the thickness of each layer for the multilayer AR coating using optimized genetic operators and algorithm parameters. The program is successfully tested to design AR coating in NIR wavelength range to achieve average reflectivity (R) below 10 −3 over the spectral bandwidth of 200 nm with different combinations of coating materials in the stack. The random-point crossover operator is found to exhibit a better convergence rate of the solution than single-point and double-point crossover. Periodically re-initializing the thickness value of a randomly selected layer from the stack effectively prevents the solution from becoming trapped in local minima and improves the convergence probability.