Optimization of Silicon-Based Fabrication Process Modeling for Optical Modulator

Abstract

Silicon-based photonic devices have emerged as a high demand technology for a wide range of applications. Most of these devices can be realized by optical waveguides where it forms the basic structure for device construction. This project involved the optimization of silicon waveguide fabrication process modeling using Silvaco. The optimized silicon-based waveguide components are aimed to be implemented in future photonic devices such as optical modulators. The Taguchi methods are employed to study the influence of fabrication parameters variations on the fabrication performance such as etch rate and waveguide structure. Four fabrication parameters are investigated includes the diffusion temperature of the N - type channel, diffusion temperature of the P - type channel, silicon orientation and oxide thickness. The result shows that the temperature during the diffusion on an N - type channel has the most influence on the performance of the modulation efficiency of the silicon optical waveguide.