Abstract
Magnetron sputtering of a Nb target in a fixed composition ArN 2 gas was used for the preparation of NbN superconducting thin films. The optimum sputtering parameters were determined by analysis of the film deposition rate dependence on the mixed gas pressure. This analysis also allowed estimation of the binding energy of the thin NbN layer formed on the target surface during the sputtering process. This made the quantitative predictions of the optimum deposition parameters in terms of a reactive sputtering model possible.
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