Pulsed Magnetron Sputtering of Ceramic SHS Targets as a Promising Technique for Deposition of Multifunctional Coatings

Abstract

The processes of the pulsed magnetron sputtering (PMS) of multicomponent ceramic targets are studied upon deposition of functional coatings of various purposes. The regularities of changes in the structural characteristics, as well as mechanical and tribological properties, under increasing magnetron power frequency are studied. Summarizing the results obtained using the PMS technology upon the deposition of coatings using multicomponent SHS cathodes, the following conclusions can be drawn. a) The structure of coatings. Pulsed sputtering leads to the development of a denser and, at the same time, more defective structure with a high level of internal stresses and roughness. The effect of the pulsed mode on the grain size depends on the sputtering type and configuration of magnetic fields. For reaction sputtering, structural refinement is observed in some cases. The effect of increasing the thickness of reaction coatings due to the commencement of interaction between atoms sputtered from the target and nitrogen atoms at precipitation and minimization of target surface poisoning is found. b) Coating properties. The effect of a pulsed mode on the adhesion strength of coatings is reduced to its decrease. Dependences of hardness and other mechanical properties on the frequency of the pulse power have an extreme character with a maximum at 50 kHz. The use of low frequencies (50–150 kHz) leads to a decrease in the friction factor. At the transition to the pulsed mode, the friction factor stabilizes during the test and, in most cases, wear resistance increases.