Abstract

Ferroelectric tunnel junctions (FTJs) have recently attracted considerable interest as a promising candidate for applications in the next-generation non-volatile memory technology. In this work, using an ultrathin (3 nm) ferroelectric Sm0.1Bi0.9FeO3 layer as the tunnelling barrier and a semiconducting Nb-doped SrTiO3 single crystal as the bottom electrode, we achieve a tunnelling electroresistance as large as 105. Furthermore, the FTJ memory states could be modulated by light illumination, which is accompanied by a hysteretic photovoltaic effect. These complimentary effects are attributed to the bias- and light-induced modulation of the tunnel barrier, both in height and width, at the semiconductor/ferroelectric interface. Overall, the highly tunable tunnelling electroresistance and the correlated photovoltaic functionalities provide a new route for producing and non-destructively sensing multiple non-volatile electronic states in such FTJs.

Highlights

  • Ferroelectric tunnel junctions (FTJs) have recently attracted considerable interest as a promising candidate for applications in the next-generation non-volatile memory technology

  • The FTJ memory states could be modulated by light illumination, which is accompanied by a hysteretic photovoltaic effect

  • As the thickness of the ferroelectric layer decreases to a few nanometres, electrons can quantum mechanically tunnel through the ferroelectric barrier, which is the basis for the operation of so-called ferroelectric tunnel junctions (FTJs)[6,7]

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Summary

Introduction

Ferroelectric tunnel junctions (FTJs) have recently attracted considerable interest as a promising candidate for applications in the next-generation non-volatile memory technology. The FTJ memory states could be modulated by light illumination, which is accompanied by a hysteretic photovoltaic effect These complimentary effects are attributed to the bias- and light-induced modulation of the tunnel barrier, both in height and width, at the semiconductor/ferroelectric interface. A giant TER of up to 104 was observed in a FTJ of Pt/ BaTiO3 (BTO)/Nb:SrTiO3 (NSTO)[22] This remarkable improvement in performance originates from the suppression/ enhancement of the space charge layer in the semiconducting NSTO electrode, that is, both the height and width of the ferroelectric tunnel barrier were modulated[22,23]. FTJ-based memristor was demonstrated in Co/BTO/LSMO heterostructures, and the operating mechanism was related to the field-induced interface charge redistribution[29] These ground breaking results provided new routes towards the development of high-performance FTJs, and the underlying mechanism clearly warrants further investigations. The light-absorbing depletion layer in NSTO induces a photovoltaic (PV) effect, which is dependent on the resistance state of the device and provides a new route to non-destructive reading in addition to the conventional current-based route

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