Abstract
High quality, low-leakage superconductor-insulator-superconductor (SIS) junctions with Nb electrodes and aluminum oxide barriers are widely reported in the literature, and have become integral in the design and fabrication of various superconducting circuits. However, as current densities are increased, aluminum oxide based tunnel barriers show excess leakage currents due to defects and pinholes in the barrier layer. First reported by our group in 2007, AlN tunnel barriers grown via inductively coupled plasma (ICP) nitridation of Al overlayers are a promising alternative, producing low-leakage Nb/Al-AlN/Nb SIS junctions, with current densities in excess of 30 kA/cm 2 . A correlation between junction quality and plasma dissociation has been reported for Nb/Al-AlN/Nb junctions produced via an electron cyclotron resonance (ECR) plasma. In this work, a quantitative measure of the relative dissociation (RD) of an ICP is determined through the use of a commercially available Ocean Optics USB4000 Optical Spectrometer. The effects of various ICP parameters on the RD, and a correlation between the RD and quality of the resulting Nb/Al-AlN/Nb junctions are reported.
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