Optical proximity correction for a versatile LCD based direct write maskless photoplotter

Abstract

The digital simulation of a photoplotter’s direct write process, where the reconfigurable mask is a liquid crystal microdisplay, leads to the development of two proximity correction techniques. The first works by modifying dimensions and in adding serifs or assistant features to the original structure design. The second, more innovative and only exploitable with a grey level capable direct writing device, precompensates structures with a multilevel spatial modulation of the luminous energy. We also present the computer simulation used to develop these OPC techniques and confirm its performance by comparing modelled and experimental results.