Abstract
Fabry–Pérot hydrogenated amorphous silicon (a-Si:H)/amorphous-SiOx:H microcavities with an erbium-doped a-Si:H active region are fabricated by a plasma-enhanced chemical-vapor deposition technique in a single technological cycle without exposure to air between the intermediate operations. A metalorganic compound is used to incorporate erbium in the active a-Si:H layer. Transmission, reflection, and photoluminescence spectra of the microcavities are measured. The experimental data are compared to theoretical calculations performed in terms of field amplitudes generated by stochastic excitation sources.
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