Abstract
Proton beam writing (PBW) is a high-resolution direct write lithographic technique suitable for the fabrication of micro/nano optical components with smooth vertical sidewalls. In the present work PBW was used to fabricate smooth micro cavities in negative tone photoresist SU-8 and Rhodamine B doped SU-8. Two different laser cavities based on whispering gallery mode resonators were fabricated using PBW. The laser cavities in Rhodamine B doped SU-8 resist were optically pumped with a pulsed frequency doubled Nd: YAG laser, and emits light in the chip plane at 643 nm. The presented laser cavities showed pump threshold as low as 3 μJ/mm 2 , which is the lowest threshold reported in planar cavities fabricated in Rhodamine B dye based polymer laser cavities.
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