Abstract
The thickness and the dielectric constants of thin metal films on glass substrates are determined by two different methods. The first method is a combination of transmission and ellipsometer measurements (TELL method) and the second is based on attenuated total reflection (ATR method in the Kretschmann arrangement). For comparison, both methods are applied to gold films within a thickness range of 20-80 nm. Furthermore, the TELL method was applied to chromium films of thicknesses up to 150 nm. All experiments are done with a He-Ne laser at 633-nm wavelength.
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