Optical constants of titanium and silicon dioxide films

Abstract

In this paper a study of optical constants of titanium and silicon dioxide films prepared in Balzers BAK 600 and BA 510 conventional high-vacuum apparatus is described. Both the dispersion and the geometrical thickness were determined from normal reflectance spectrum by adapted general algorithm of the statistical interpretation of measured data. The dependence of optical constants on oxygen pressure for both materials and the evaporation rate dependence for titanium dioxide were obtained. The time changes of these constants were also measured.