Optical Beam-Based Defect Localization Methodologies for Open and Short Failures in Micrometer-Scale 3-D TSV Interconnects

Abstract

We report laser-based fault isolation methodologies for the localization of open and short failures in $1 \times 5\,\,\mu \text{m}$ via-last through-silicon via (TSV) structures for 3-D system-on-chip (SoC) integration. Due to the photosensitive TSV interconnect capacitance, observation of the photocapacitance response enables nondestructive localization of metallization ruptures. A light-induced capacitance alteration (LICA) measurement is demonstrated on an open failed $1 \times 5\,\,\mu \text{m}$ TSV chain structure with a manufacturing defect. We validate our measurements with active voltage contrast imaging in the scanning electron microscope (SEM) and focused-ion beam (FIB) cross sectioning. Second, TSV dielectric defects generating leakage current between TSV and substrate (i.e., short defects) are detected and localized by sensing the laser-induced TSV photocurrent. An optical beam-induced current (OBIC) measurement is demonstrated on electrically overstressed TSV array structures whereby multiple TSVs are configured in a parallel arrangement. By applying a selective substrate removal process, we can expose the full TSV array and perform optical and tilted SEM inspection and reveal pinhole defects in the TSV liner. We further investigate the effect of breakdown energy on the pinhole formation, relate electrical measurements to SEM inspection, and confirm our results by FIB cross sectioning.