Optical and structural studies of hydride vapor phase epitaxy grown GaN

Abstract

Thick films of hydride vapor phase epitaxy (HVPE) grown GaN were studied by various techniques. Time-integrated and time-resolved photoluminescence (PL) measurements were performed at room temperature and 77 K. The time-integrated PL spectrum has no observed deep-level transitions and a very narrow linewidth, which indicates good material quality. Time-resolved PL spectra are also presented and the temporal evolution of the PL around the band-gap exhibits a biexponential decay with a fast and a slow decay component. Cathodoluminescence, x-ray, and Raman spectroscopy were also used. The full width half maximum of the x-ray rocking curve for our sample is approximately 375 arcsec. The polarized Raman spectra exhibited only the allowed modes. The deposited GaN films were found to be relatively stress free. The x ray and Raman analysis also revealed that the HVPE-grown GaN films are of high crystal quality. The effect of thermal annealing on the sample was also investigated by time-integrated and time-resolved PL and Raman spectroscopy. No significant changes in the material were observed in either time-integrated or Raman spectroscopy. The film was thermally stable upon annealing up to 1000 °C in N2 ambient based on the results of these measurements. In time-resolve photoluminescence measurement, the temporal evolution of the band-edge transitions broadens after each annealing step and is significantly different after the 1000 °C anneal.