Abstract
Tungsten oxide (WO3) nanostructure thin film has been grown on a silicon wafer and glass slide substrate by reactive magnetron sputtering at a different oblique angle from 56°, 70° and 86°. The effect of static and dynamic substrate tilt rotation during the film deposition on microstructure and the optical property was investigated. The results showed that all of the prepared WO3 nanostructure films were amorphous. The film thickness of the prepared films decreased with increasing deposition angles. Field emission scanning electron microscopy (FE-SEM) revealed that the sample prepared at 70° and 86° with substrate tilt rotation was nanocolumnar structure due to the self-shadowing effect. In addition, the optical transmittance with the omnidirectional property was studied by spectrophotometer. The optical transmittance was about to 86% with a good WO3 nanorod thin films as static OAD at 86°. The energy bandgap can be estimated at about 3.11–3.28 eV.
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